XTROLOGY
Live / Applied — Final refusal mailed (as of 02 Mar 2026)
What this means for you
Not registered yet, but its 03 Apr 2025 filing date beats anything filed after it. If it registers, the owner can stop confusingly similar uses in the classes it covers.
Record
- Serial number
- 79425805
- Mark type
- Stylized text
- Filed
- 03 Apr 2025
- Attorney of record
- Pamela N. Hirschman
Goods and services
- Class 009 — Scientific and electric apparatus: Semiconductor wafer inspection apparatus, namely, inspection machines for the physical inspection of semiconductor wafers; analyzing apparatus for defect of semiconductor wafers, namely, optical analyzers for analyzing defect of semiconductor wafers; analyzing apparatus for stress of semiconductor wafers, namely, optical analyzers for analyzing stress of semiconductor wafers; analyzing apparatus for composition of semiconductor wafers, namely, optical analyzers for analyzing composition of semiconductor wafers; semiconductor wafer measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor wafers; semiconductor wafer testing equipment; semiconductor photomask inspection apparatus, namely, inspection machines for the physical inspection of semiconductor photomask substrates; analyzing apparatus for defect of semiconductor photomasks, namely, optical analyzers for analyzing defect of semiconductor photomasks; analyzing apparatus for stress of semiconductor photomasks, namely, optical analyzers for analyzing stress of semiconductor photomasks; analyzing apparatus for composition of semiconductor photomasks, namely, optical analyzers for analyzing composition of semiconductor photomasks; semiconductor photomask measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor photomasks; semiconductor photomask testing equipment; semiconductor reticle inspection apparatus, namely, inspection machines for the physical inspection of semiconductor reticles; analyzing apparatus for defect of semiconductor reticles, namely, optical analyzers for analyzing defect of semiconductor reticles; analyzing apparatus for stress of semiconductor reticles, namely, optical analyzers for analyzing stress of semiconductor reticles; analyzing apparatus for composition of semiconductor reticles, namely, optical analyzers for analyzing composition of semiconductor reticles; semiconductor reticle measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor reticles; semiconductor reticle testing equipment; semiconductor substrate inspection, namely, inspection machines for the physical inspection of semiconductor substrates; analyzing apparatus for defect of semiconductor substrates; analyzing apparatus for stress of semiconductor substrates, namely, optical analyzers for analyzing stress of semiconductor substrates; analyzing apparatus for composition of semiconductor substrates, namely, optical analyzers for analyzing composition of semiconductor substrates; semiconductor substrate measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements of semiconductor substrates; semiconductor substrate testing equipment; optical analyzers, namely, sensors for mapping semiconductor wafers; Raman spectrographic measurement apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition and shape using Raman spectrometers and structural parts and accessories therefor; optical analyzers, namely, Raman spectroscopic analyzing apparatus, and parts and accessories therefor; measuring apparatus, namely, scientific instrumentation for measuring film thickness; measuring apparatus, namely, scientific instrumentation for measuring film thickness, defect, stress, composition, shape and elements using spectral measurements; automated optical inspection apparatus, namely, inspection machines for the physical inspection of semiconductor substrates, semiconductor wafers, semiconductor reticles, semiconductor photomasks and semiconductor pellicles; X-ray fluorescence measuring apparatus, namely, scientific instrumentation for measuring semiconductor substrates, semiconductor wafers, semiconductor reticles, semiconductor photomasks and semiconductor pellicles using X-ray fluorescence; measuring or testing machines and instruments, namely, inspection machines for the physical inspection of semiconductor substrates, semiconductor wafers, semiconductor reticles, semiconductor photomasks and semiconductor pellicles, and structural parts and accessories therefor; photoluminescence or fluorescence microscope spectrometers, and structural components and accessories therefor; optical machines and apparatus, namely, Raman spectrometers, photoluminescence spectrometers, ellipsometers, interferometric film thickness gauges, X-ray fluorescence analyzers, and measuring instruments using laser scattering; optical machines and apparatus, namely, microscopes with viewing camera; cinematographic machines and apparatus; laboratory apparatus and instruments, namely, Raman spectrometers, photoluminescence spectrometers, ellipsometers, interferometric film thickness gauges, X-ray fluorescence analyzers, and measuring instruments using laser scattering; downloadable and recorded computer software for the inspection, defect analysis, stress analysis, composition analysis, measurement and testing of semiconductor wafers, photomasks, reticles and substrates; scanning probe microscopes; X-ray fluorescence analyzing apparatus, namely, X-ray fluorescence analyzers; rotary converters; phase modifiers; batteries and dry cells; electric meters, magnetic electricity meters, and electrical outlet testers; electric wires and cables; spectacles and safety goggles; fire alarms; gas alarms
Owner
Prosecution history
- 02 Mar 2026 — NOTIFICATION OF FINAL REFUSAL EMAILED
- 02 Mar 2026 — FINAL REFUSAL E-MAILED
- 02 Mar 2026 — FINAL REFUSAL WRITTEN
- 29 Jan 2026 — TEAS/EMAIL CORRESPONDENCE ENTERED
- 29 Jan 2026 — CORRESPONDENCE RECEIVED IN LAW OFFICE
- 29 Jan 2026 — TEAS RESPONSE TO OFFICE ACTION RECEIVED
- 08 Jan 2026 — ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
- 08 Jan 2026 — TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
- 08 Jan 2026 — APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
- 08 Jan 2026 — TEAS CHANGE OF OWNER ADDRESS RECEIVED
- 22 Nov 2025 — REFUSAL PROCESSED BY IB
- 30 Oct 2025 — NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
- 30 Oct 2025 — REFUSAL PROCESSED BY MPU
- 12 Sept 2025 — NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
- 11 Sept 2025 — NON-FINAL ACTION WRITTEN