TRITON

What this means for you

This application is over — abandoned 21 Nov 2002. The name may be available, but check before relying on it — rights can also come from actual use, not only from the register.

Record

Serial number

76218315

Mark type

Word mark

Filed

28 Feb 2001

Abandoned

21 Nov 2002

Attorney of record

ROBERT W. BECKER

Goods and services

• Class 007 — Machines and machine tools: Machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips and solar cells; machines for drying, cleaning or etching silicon wafers for use in the in the manufacture of semiconductor chips; wet processing machines for use manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and machine parts, namely, drying units using nitrogen, alcohol vapors or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, and solar cells
• Class 011 — Environmental control apparatus: Drying and wet processing units for the treatment of semiconductor substrates, silicon chips, wafers, liquid crystal substrates, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces
• Class 037 — Building construction and repair services: Installation and servicing of the following machines and units, machines for manufacturing semiconductor substrates, silicon chips, wafers, liquid crystal display substrates, liquid crystal displays, semiconductor chips, and/or solar cells, machines for drying, cleaning and/or etching silicon wafers for use in the manufacture of semiconductor chips; wet processing machines for use in the manufacture of semiconductor chips and wet processing machines for oxidation by diluted hydrofluoric and hydrochloric acid and for particle removal in an ammonia and hydrogen peroxide acid bath, all for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells; and drying units using nitrogen, alcohol vapors and/or mixtures thereof for use on semiconductor substrates and wafers, silicon wafers, liquid crystal display substrates, liquid crystal displays, solar cells, as machine parts; drying and wet processing units for the treatment of semiconductor substrates, silicon chips wafers, liquid crystal displays, semiconductor wafers and solar cells as well as their surfaces

Owner

• STEAG MicroTech GmbH, 72124 Pliezhausen, DE

Prosecution history

• 06 Jan 2003 — ABANDONMENT - EXPRESS MAILED
• 21 Nov 2002 — CORRESPONDENCE RECEIVED IN LAW OFFICE
• 13 Dec 2002 — ASSIGNED TO EXAMINER
• 08 Jul 2002 — TEAS CHANGE OF CORRESPONDENCE RECEIVED
• 03 Jul 2002 — FINAL REFUSAL MAILED
• 21 Nov 2001 — CORRESPONDENCE RECEIVED IN LAW OFFICE
• 07 May 2001 — UNRESPONSIVE/DUPLICATE PAPER RECEIVED
• 07 May 2001 — Sec. 1(B) CLAIM DELETED
• 22 May 2001 — NON-FINAL ACTION MAILED
• 07 May 2001 — ASSIGNED TO EXAMINER