TESTBOURNE

Live / Registered — Registered and renewed (as of 24 Sept 2025)

What this means for you

Registered since 11 Jan 2005. The owner can stop confusingly similar uses in the classes it covers; it stays on the register as long as the owner keeps up the maintenance filings (next due by 11 Jan 2025).

Record

Serial number
76177386
Registration number
2916854
Mark type
Word mark
Filed
07 Dec 2000
Published for opposition
19 Oct 2004
Registered
11 Jan 2005
Next maintenance due
11 Jan 2025
Attorney of record
Mainak H. Mehta

Goods and services

  • Class 001 — Chemicals: Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, cesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafnium, holmium, indium, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, osmium, palladium, phosphorous, platinum, praseodymium, rhenium, rhodium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, sulphur, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc, zirconium, borides, carbides, fluorides, nitrides, oxides, silicides, selenides, sulphides, tellurides, ammonium compounds, alloys, metal alloys, compounds of aluminum, antimony, arsenic, barium, beryllium, bismuth, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafniurn, holmium, indium, iodine, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, mercury, molybdenum, neodymium, nickel, niobium, palladium, phosphorous, platinum, potassium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium, polymers for use as sputtering targets, acrylonitrile butadiene styrene, chlorinated polyvinyl chloride, chlorotrifluoro-ethylene, polyethylene, polyetheretherketone, polyethylene teraphthalate, polyethylene teraphthalate modified with cyclohexane dimethanol, polyvinyl chloride, polyvinylidene fluoride, polytetrafluoroethylene and polyamide, silicon monoxide, filaments of tungsten;[ photographic chemicals; fluids for hydraulic circuits and vacuum pumps; fluids for use with abrasives used in the scientific examination of samples by electron-microscopy, laboratory analysis processes, precision cutting, grinding and polishing of metallics, glasses and ceramic components used in the aerospace, automotive, capacitor, electrical resistor and electro-optical, electro-medical, magnetic, micro-electronic, optical and sensor industries; high vacuum fluids for use in pumps specific to the high vacuum industry, namely, mechanical and vapor diffusion pumps;] high purity chemicals for use in thin vapor deposition CVD in atmospheric pressure, high vacuum and ultra vacuum processing applications for the manufacture of computers, microprocessors, flat bed display screens, magnetic recording heads, semi-conductor devices and super-conductive devices, electrical components, namely, resistors, capacitors, and cathode-ray tubes, vacuum distillation and freeze drying of foodstuffs, metallurgy, pharmaceutical, and optical industries; adhesives used in manufacturing, namely, high vacuum adhesives and ultra-high vacuum sealing adhesives, low-temperature waxes for mounting optical components during polishing processes, and silver epoxy resins for bonding sputtering targets to sputtering sources

Owner

Prosecution history

  • 24 Sept 2025 — NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
  • 24 Sept 2025 — REGISTERED AND RENEWED (SECOND RENEWAL - 10 YRS)
  • 24 Sept 2025 — REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
  • 22 Sept 2025 — CASE ASSIGNED TO POST REGISTRATION PARALEGAL
  • 30 May 2025 — TEAS SECTION 8 & 9 RECEIVED
  • 11 Jan 2024 — COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
  • 29 Jul 2015 — NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
  • 29 Jul 2015 — REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
  • 29 Jul 2015 — REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
  • 29 Jul 2015 — CASE ASSIGNED TO POST REGISTRATION PARALEGAL
  • 08 Jul 2015 — TEAS SECTION 8 & 9 RECEIVED
  • 15 Jul 2011 — NOTICE OF ACCEPTANCE OF SEC. 8 & 15 - E-MAILED
  • 15 Jul 2011 — REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
  • 15 Jul 2011 — CASE ASSIGNED TO POST REGISTRATION PARALEGAL
  • 06 Jun 2011 — TEAS SECTION 8 & 15 RECEIVED

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